SKU:82698602398
Nickel<111> Film (100nm) Coated SiO2/Si Wafer -(100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm - Ni-SO/Si-101005S1
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Ships within 48 hours · Estimated delivery Jul 15 - Jul 20
Description
Nickel<111> Film (100nm) Coated SiO2/Si Wafer -(100) P/Boron ,10x10x0.5mmSSP, R:1-20 ohm.cm - Ni-SO/Si-101005S1Nickel Film Nickel Film Thickness: 100nm Film Crystallinity: (111) oriented polycrystals Silicon Wafer Specifications: Conductive type: Si P type, B doped Resistivity: 1 20 ohm cm Size: 10x10x0. 5mm SiO2 Thichness: 300 nm Orientation: (100) + 0. 5o Polish: One sides polished Surface roughness: Prime Packing: Vacuum packed on a 4" single wafer carrier Optional: you may need tool below to handle the wafer ( click picture to order ) Related Products Thin
BNC-J3 Female to
15 mg / cm^2
Tubes have been evacuated to 10-7 Torr at room temperature
Adopts 1" or 2" O
Polish: One side EPI polished by CMP technology with minimum sub-surface damage
the resistance of heating elements will not be affected by aging under normal operating conditions
Such an alumina tube can be used at operating temperatures of 1700 oC in both oxidizing and reducing atmospheres
Each battery and supercapacitor analyzer is required to connect to one battery testing control unit
Package: 1000 class clean plastic bag
Electrolyte Filling with recommended amount in glovebox
Lattice Constant(Å): a=5
liquid flow rate
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Exchange/Return Notes
- We offer a 30-day return/exchange service after receiving.
- Final sale items are not eligible for returns or exchanges.
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